科学与环境
Plasma treatment helps reveal how molecular coatings dope silicon
来源: Phys.org - latest science and technology news stories · 发布于
Controlling dopant concentration near the silicon surface is increasingly important for ultrashallow junctions and nanoscale devices. Mixed monolayer doping (MMLD) offers a surface-chemistry-based approach in which dopant-containing molecules are mixed with nondopant molecules to
Controlling dopant concentration near the silicon surface is increasingly important for ultrashallow junctions and nanoscale devices. Mixed monolayer doping (MMLD) offers a surface-chemistry-based approach in which dopant-containing molecules are mixed with nondopant molecules to tune the amount of dopant available at the silicon surface before thermal diffusion.
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